Substrate
Size
Thickness
Flatness
Film Specification
| CHROME | Vacuum Deposited, DC Sputtered in Class 100 Environment | |
| THICKNESS/ OPTICAL DENSITY | Standard: 1000ű 8% / O.D.=3.0±0.2 @ 450nm Custom Thicknesses up to 5 µm |
|
| REFLECTIVITY | CHROME | |
| LOW | <12% @ 400nm | |
| MID | <33% @400nm | |
| HIGH | <55% @400nm | |
| PROCESS | Etchable in all conventional Wet Etch systems.Plasma Grade recommended for Dry Etch systems | |
| PHOTORESIST | Shipley 1800 or AZ 1500 filtered to 0.2 micron at point of use. All widely used positive and negative optical and E-beam resist available | |