| Mask Fabrication |
| - Mask Dimensions |
| - Fabrication Process |
| - How to Order |
| Silicon Microfabrication |
| - Capabilities |
| - Facilities |
| One-Stop Services |
Mask Fabrication
Lithographic photomasks are typically transparent glass templates covered with chrome patterns. They are designed to optically transfer patterns to wafers or other substrates in microfabrication.
Depending on the difference of the substrates, BondaTek fabricates three types of photomasks: quartz masks, soda lime masks and mylar masks. The attainable critical dimensions (CD, i.e. minimum feature sizes) for these three types of masks are 0.75, 1.5, and 25 micrometers, respectively. Typical mask dimensions are 3"x3", 4"x4", 5"x5", 6"x6" and 7"x7". These photomasks are either direct-written by e-beam or laser systems or are manufactured from reticles using photo repeater systems.
Tighter specifications, larger mask sizes and other types of masks are also available upon request. Contact us for more information about our capabilities.
MATERIALS
- Semiconductor Si wafers and Solar wafers
- Silicon on insulator (SOI) wafers
- Mask blanks (soda lime and quartz)
- Glass wafers (Pyrex 7740, quartz, soda lime, etc)
- AIIIBV compounds (GaAs, GaP, InP, InAs, etc)
- Sapphire wafers
- Sputtering targets
- Thin films-Oxide, nitride
- Packing boxes for crystal, wafers, filter, chip, etc
- Optical component
SERVICES
- Fabrication of soda lime/quartz photolithographic masks
- Silicon microfabrication (wet etching, dry etching and wafer bonding)
- Consultancy of fabrication process
- Characterization of microdevices/microsystems
- Consultancy of microfluidics and biological microdevices
Service Hotline:
Tel.: +65-6515 8750
Fax : +65-6515 8795
Email: sales@bondatek.com